Ultra-high vacuum (UHV) is the vacuum regime characterised by pressures lower than about 10−7 pascal or 100 nanopascals (10−9 mbar, ~10−9 torr). UHV conditions are created by pumping the gas out of a UHV chamber. At these low pressures the mean free path of a gas molecule is approximately 40 km, so gas molecules will collide with the chamber walls many times before colliding with each other. Almost all molecular interactions therefore take place on various surfaces in the chamber.
Our system offerings in the Chemical Lab come with a variety of options and provide clean environments of less than 1 part per million oxygen and moisture levels. Nichwell systems will help ensure that research materials used in the glovebox will not be damaged by contaminates such as oxygen and moisture.