μ-401A-R Lab Evaporation Deposition Platform


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Why Choose Us

The Nichwell Solutions advantage.

 

When you select Nichwell Solutions as your technology provider, you'll be placing your IT infrastructure in the hands of experienced, trained professionals. We take a different approach and the results are clear. People love our team and the services we provide.

Knowledgeable Experts.

A certified staff of technicians and engineers.

We lower your support costs by correctly diagnosing and fixing issues the first time and by providing effective preventive maintenance to help you avoid expensive downtime and repairs. Our 100% Nicehwell-based team consists of experienced, seasoned professionals certified by Microsoft, Citrix, Dell, VMWare, Veeam and CompTIA. We are your IT department.

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Dedicated account representative and support system for your organization

Our sales team is not influenced by commissions, manufacturer incentives or quotas because that's not how we do business. We explore your operations, carefully evaluate your security, establish your monitoring and technology needs, then provide a tailored proposal. Because our only interest is a satisfied long term client, you can be sure we're on your side and our solutions will always revolve around you.

No Outsourcing

Every service is owned, managed and backed by our in-house professionals.

When you purchase a re-sold service and then that service has a problem, response and resolution times can suffer. That's why we host our own servers in carrier-class, US-based data centers and we don't resell 3rd party hosted services to our clients. We're control freaks. Say goodbye to delays, excuses, finger pointing and blame-games. If we offer it, we support it. It's as simple as that.

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The key to our client service is our seamless integration of deep industry and functional expertise with tools and capabilities to support execution and make change happen—on a global scale.

μ-401A-R Lab Evaporation Deposition Platform

型号

EVAP400S

主真空室

方形前开门结构,尺寸L×W×H:400×400×450mm

进样室(选配)

开门结构,尺寸约为ø200 X 300mm

真空系统配置

主真空室

复合分子泵、机械泵、气动闸板阀

进样室

机械泵、分子泵、阀门

极限压力

主真空室

≤6. 67x10-5pa(经烘烤除气后)

进样室

≤6.67X10-4 pa(经烘烤除气后)

恢复真空时间

主真空室

30分钟可达到6. 6x10-4 pa(系统短时间暴露大气并充干燥氮气开始抽气)

进样室

30分钟可达到6. 6x10-3 Pa (系统短时间暴露大气并充干燥氮气开始抽气)

磁控靶组件

2-4套永磁靶;靶材尺寸ø60mm (其中一个可溅射磁性材料);各靶射频溅射和直流溅射兼容;靶内水冷;三个靶可共同折向上面的样品中心;靶与样品距离90~110mm可调;每个靶配气动挡板。

基片加热台

样品尺寸

ø3英寸

运动方式

基片可连续回转,转速0-30rpm

加热

基片加热最高温度600℃±1℃

挡板形式

进口SMC转角气缸控制

工艺气路系统

质量流量控制器2-4路

*可选部件

进样室磁控靶组件

永磁靶,靶材尺寸ø 60mm。

膜厚仪

国产/进口

静音气泵

无油润滑

计算机控制系统

自动控制、工艺读入、参数设置、实时监控等功能

设备占地面积

主机

1800X1200mm2