μ-401A-R Lab Evaporation Deposition Platform


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μ-401A-R Lab Evaporation Deposition Platform

Type

EVAP400S

Main vacuum chamber

Square front door opening structure, size: L×W×H:400×400×450mm

Sample chamber (optional)

Door opening structure, size is about ø200 X 300mm

Vacuum system configuration

Main vacuum chamber

Compound molecular pump, mechanical pump, pneumatic gate valve

Sample chamber

Mechanical pump, molecular pump, valve

Ultimate pressure

Main vacuum chamber

≤6. 67x10-5pa(After baking and degassing

Sample chamber

≤6.67X10-4 pa(After baking and degassing

Vacuum recovery time

Main vacuum chamber

30 minutes can reach 6. 6x10-4 pa (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping)

Sample chamber

30 minutes can reach 6.6x10-3 Pa (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping)

Magnetron target assembly

2-4 sets of permanent magnetic targets; target size ø60mm (one of which can be sputtered magnetic material); each target is compatible with RF sputtering and DC sputtering; the target is water-cooled; the three targets can be folded to the center of the sample above; the target The distance from the sample is adjustable from 90 to 110mm; each target is equipped with a pneumatic baffle.

Substrate heating table

Sample size

ø3 inch

Moving method

The substrate can rotate continuously, the speed is 0-30rpm

Heat

Maximum temperature of substrate heating 600℃±1℃

Baffle form

Imported SMC corner cylinder control

Process gas system

Mass flow controller 2-4

*Optional parts

Magnetron target assembly in sample chamber

Permanent magnetic target, target size ø 60mm。

Film thickness measuring instrument

Domestic / import

Silent air pump

Oil-free lubrication

Computer control system

Automatic control, process reading, parameter setting, real-time monitoring and other functions

Equipment area

Host

1800X1200mm