ATTO10-R High Vacuum Resistance Thermal Evaporation Coating Machine

Application areas:

It is suitable for the preparation of metal electrodes, perovskite solar cells, OLEDs, semiconductor films, oxide films, organic films, etc. It can be used in scientific research units for research on new materials and new process films, and can also be used in small batches and pilot production or Test work before mass production.

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ATTO10-R High Vacuum Resistance Thermal Evaporation Coating Machine


Chamber 304L stainless steel chamber: φ400mm × H450mm

The room comes standard with up to ten spare ports based on system configuration

Vacuum test runs to 10 -8 Torr

Thermal evaporation (up to 4 independent metal evaporation boats)

Magnetron sputtering source (up to 4 , 2 ", 3" sources)

Electron beam evaporation source (4 crucibles 8cc, 8 crucibles 12cc, 6 crucibles 20cc)

Organic deposition sources (up to four)

The above configurations can be installed in combination.

Custom configurations available on request

Equipment composition:

The equipment is mainly composed of organic / metal evaporation deposition chamber, vacuum exhaust system, vacuum measurement system, evaporation source, sample heating temperature control, electrical control system, gas distribution system and other parts.

Vacuum coating room


Material: Stainless steel 1.4301 (SUS type 304), thickness 5mm, all welding seams are connected by argon arc automatic welding technology; mirror polished inner surface, three treatments on outer surface.

Size: φ400mm × 450mm (H);

Observation window

The door is equipped with a glass observation window (including anti-pollution baffle), which is convenient for observing the working situation at work.

Conform to the national standard of X-ray protection

Extra vacuum

≤6. 67x10-5pa (2×10-7Torr) (after baking and degassing)

Vacuum recovery time

≤6.67X10-4 pa(after baking and degassing)

InterfaceThree standard interfaces (φ200), expand the installation of molecular pumps and plug-in valves;
Four standard interfaces (CF35) are reserved for extended functions;
illuminationLED lighting is located on the side of the vacuum chamber for easy observation of the interior of the vacuum chamber
Leak rate

The leak detection shall be carried out according to GB T 32218-2015, and the final acceptance test shall be conducted according to the standard of ≤1x10-10PaL / s.

Vacuum system

Using "molecular pump + mechanical pump" high vacuum system:

Molecular pump

Pumping speed: 1200L / S, a true quasi-oil-free vacuum system, using down-pumping to avoid the pumping weakness of the molecular pump and improve the pumping speed; the molecular pump is guaranteed for 5 years and provides direct replacement service for damage.

  * Optional imported molecular pump

Vacuum pump

Specifications: Rotary vane vacuum pump, equipped with oil mist filter, with gas ballast control

Flow rate: 36 m³ / h (21 cfm), double substrate, vacuum

* Optional dry vacuum pump

Operating VoltageAC 230 V / 50-60 Hz, 10 A or AC 115 V / 50-60 Hz, 20 A (optional)
Pumping speed

Pumping from the atmosphere to 9×10-4Pa≤30min(exposure to the atmosphere for a short time, flushing with dry nitrogen and starting pumping)


Main valve: CC-200, high-vacuum electric linkage plug-in valve;

Front stage valve / bypass valve: GDQ-40 high vacuum pneumatic baffle valve;

Vacuum measurement

"Two lows and one high" (two resistance gauges measure low vacuum, one ionization gauge measures high vacuum) Digital display compound vacuum gauge, measuring range from 1 × 105Pa to 1 × 10-5Pa; displayed and controlled by PC Operation interlocking linkage.

* Optional imported wide range vacuum transmitter

Vacuum measurement

Part adopts metal seal, part adopts fluorine rubber ring seal;

Substrate stage
DescriptionThe sample table is made of 304 stainless steel, the substrate is placed directly above the evaporation source (full automatic lifting function), and the tooling is designed according to the size of the substrate to facilitate the user to fix the sample. Customizable high-precision etching mask plate;
SpinThe stepping motor is used to control the rotation, the magnetic fluid is sealed, the motor and the magnetic fluid are coaxial, and there will be no loss of rotation or crawling. The stepper motor is accurately controlled and the speed range is continuously adjustable from 0-30rpm;
LiftAdopt stepper motor to control rotation, magnetic fluid seal, precise control, height range 0-100mm continuously adjustable;
MaskDrawer-type structure, carrying the largest sample less than 120 × 120mm, equipped with Japanese SMC pneumatic substrate baffle, electric linkage automatic control.

Coating source

Metal evaporation source


Using water-cooled copper electrode + evaporation boat structure, there are anti-pollution partitions between the evaporation sources and each source is equipped with positioning baffles, intelligent PC control

Evaporation temperatureRoom temperature 0 ~ 1300 ℃

Metal evaporation power supply

Output Power

0~3000W ,The current is regulated by inverter, which is stable and reliable. The power of the power supply is continuously adjustable from 0 to the maximum power.

ControlRS-485 interface, power supply is continuously adjustable from 0 to maximum power.


2 sets, automatic switching control

Control System
DescriptionAdopt windows operating platform and cotrl2000 control system, and adopt IPC + network technology to realize parameter setting of main components of the whole machine, implement real-time monitoring and intelligent diagnosis of faults, and automatic monitoring of film thickness. There are two modes of automatic and manual control. In addition to taking and placing samples, all other operating processes are controlled by software on the PC; provide a friendly man-machine interface such as vacuum system, process setting, gas filling and degassing system; parameters can be set on the industrial control computer through the recipe to achieve Setting, storage and printing of equipment parameters.

It can effectively solve the accuracy, stability and reliability of the coating.

Perfect program interlocking, complete anti-misoperation design and protection; system abnormalities such as water shortage, over-current and over-pressure alarm and corresponding protection measures are implemented.

It adopts rich I / O interface design to fully meet the functional requirements of expansion and external devices.

The display controls the door opening / closing of the coating machine.

Coating process, procedure, film thickness, convenient and save printing.

Film thickness monitoring and control system

DescriptionA quartz crystal film thickness controller is used, a water-cooled film thickness probe is installed near the substrate table, and the industrial computer is connected. The film thickness meter is used to monitor the coating rate and final thickness in real time, and the accuracy can reach ± 1A (0.1nm). Real-time information is fed back to the industrial control machine. If the coating thickness reaches the set thickness, the power can be automatically controlled to stop the coating to achieve the purpose of automatic control of the film thickness. 
RangeMonitoring thickness range: 1Å ~ 99µ9999Å, resolution 1Å; monitoring rate range: 0.1Å ~ 9999.9Å.S / s, resolution 0.1Å


The coating process, process, and film thickness are all set on the PC, which can realize automatic control of the whole process. The coating process can be set on the PC and the data can be recorded.

Cooling system


The cooling water path is 8 in and 8 out, and the total water intake is controlled by a water pressure relay.

The total inlet and outlet water are connected with 1P refrigeration circulating water machine, and the temperature control range is 10-25 ℃. Provide stable cooling and circulating water to the target, metal source, molecular pump and magnetic fluid to ensure the stable operation of the equipment.

Optional equipment

Substrate stageHeatingThe use of special vacuum armored heating wire avoids the problems of traditional heating elements contaminating the vacuum chamber, contaminating the substrate, short life, and requiring frequent maintenance. The heating temperature is: room temperature ~ 300 ℃, the temperature control adopts imported Japan Shiden Electric PID intelligent temperature controller, the temperature control accuracy is ± 1 ℃.
Water cooling A stepper motor is used to control the drive rotation, dynamic sealing, and one water flow in and one out.
Liquid nitrogen coolingPatented product: A stepper motor is used to control the rotation, the magnetic fluid is sealed, the motor and the magnetic fluid are coaxial, the measured temperature is -160 ℃
Select film coatingPatented product: arbitrary film selection, automatic transfer and alignment in the home position, adjustable deposition height.
Automatic coordination coatingPatented product: film-selection stepless selection and coating function, automatic transfer and alignment for homing, adjustable deposition height
Stepless flip and rotationPatented product: realize horizontal and vertical rotation of the substrate, stepless rotation and heating, can achieve high uniformity coating.

Vacuum baking / degassing

Double heater design;

Power: 1200 W;

Mounting flange: CF35;

Quickly degas the vacuum chamber to improve the vacuum;

The baking time is shorter than the baking oven and heating belt;

Sample compartment

Door opening structure, size is about ø200 X 300mm

Vacuum system: mechanical pump, molecular pump, valve

Ultimate vacuum: ≤6.67X10-4 pa (after degassing after baking).

Vacuum recovery time: 30 minutes can reach 6.6x10-3 Pa (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start)

Chamber heatingThe vacuum chamber is equipped with a heating system, the temperature is 200 ℃, and the temperature control is ± 1 ℃
Cooling system

The cooling water path is 8 in and 8 out, and the total water intake is controlled by a water pressure relay.

The total inlet and outlet water are connected with 1P refrigeration circulating water machine, and the temperature control range is 10-25 ℃. Provide stable cooling and circulating water to the metal source, molecular pump and magnetic fluid to ensure the stable operation of the equipment.

Other instructions
Product certification

ISO9001 certification、CE certification、UL certification

Application considerationsFor details, please refer to the instruction manual for danger, warning, caution, etc.