ATTO10-E High Vacuum Electron Gun Coating System

Cathode voltage 6kv-15kv, cathode heating power AC 3V + 3V, 60A adjustable

Cold crucible between beams 0-500ma, direct cold crucible 0-1a

The capacity of the crucible is 4-hole intercooling 4 × 17ml, 4-hole direct cooling 4 × 22ml, ring direct cooling 85ml

The X deflection current of the magnetic field power supply is ± 2A adjustable, and the scanning frequency is 10-250hz; the y deflection current is ± 2A adjustable, and the scanning frequency is 10-250hz

Starting vacuum 6.7 × 10-3 pa

The positioning of crucible (four hole crucible) is controlled automatically or manually

Water inlet temperature of crucible cooling water ≤ 25 ℃, water inlet pressure ≥ 0.2MPa, water flow ≥ 8L / min

Ground resistance of electron gun body ≤ 4 Ω


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ATTO10-E High Vacuum Electron Gun Coating System

Vacuum coating system

Description 

Material: stainless steel 1.4301 (Sus Type 304), 5mm thick, all weld joints are connected by argon arc automatic welding technology; the inner surface is polished with mirror surface, and the outer surface is treated with three methods.

Size: Φ 400 × h450mm;

Volume0.056m³
Observation window 

The door is equipped with a glass observation window (including anti pollution baffle) to facilitate the observation of working conditions.

Meet the national standard of X-ray protection

Extra vacuum 

≤6. 67x10-5pa (2×10-7Torr) (after baking and degassing)

Vacuum recovery time 

≤6.67X10-4 pa(after baking and degassing)

Interface Three standard interfaces (φ 200) for expanding and installing molecular pump and plug-in valve;
Four standard interfaces (cf35) are reserved for expanding functions;
Illumination LED lighting is located at the side of the vacuum chamber to facilitate observation of the vacuum chamber
Leak rate 

Leakage detection shall be carried out for the box according to GB t 32218-2015, and the final acceptance test shall be carried out according to the standard of ≤ 1x10-10pal / s.

Vacuum system
Description 

Adopt "molecular pump + mechanical pump" high vacuum system:

Molecular pump 

Pumping speed: 1200L / s, a real quasi oil-free vacuum system, adopts down pumping to avoid the pumping weakness of the molecular pump and improve the pumping speed; the molecular pump is guaranteed for 5 years and provides direct replacement service for damage.

*Optional imported molecular pump

Vacuum pump 

Specification: rotary vane vacuum pump with oil mist filter and air ballast control

Flow: 36 m 3 / h (21 CFM), double substrate, vacuum

*Optional dry vacuum pump

Operating voltage AC 230 V / 50-60 Hz, 10 A or AC 115 V / 50-60 Hz, 20 A (optional)
Pumping speed 

 Extract from the atmosphere to 9×10-4Pa≤30min (expose the atmosphere for a short time and start to extract after flushing into dry nitrogen)

Valve 

Main valve: cc-200, high vacuum electric linkage gate valve;

Front stage valve / bypass valve: gdq-40 high true air operated damper valve;

Vacuum measurement 

"Two low and one high" (two resistance gauges measure low vacuum, one ionization gauge measures high vacuum) digital display composite vacuum gauge, measuring range is from 1 × 105Pa to 1 × 10-5pa; it is displayed and controlled by PC, which can realize operation interlock linkage.

*Optional imported wide range vacuum transmitter

Vacuum measurement 

Some of them are sealed with metal and some of them are sealed with fluororubber rings;

Substrate stage 
Description The sample table is made of 304 stainless steel, the substrate is placed directly above the evaporation source (full automatic lifting function), and the tooling is designed according to the size of the substrate to facilitate the user to fix the sample. Customizable high-precision etching mask plate;
SpinThe stepper motor is used to control the driving rotation, the magnetic fluid is sealed, the motor and the magnetic fluid are coaxial, and there is no loss of rotation, crawling and other situations. The stepper motor is controlled accurately, and the speed range is 0-30rpm continuously adjustable;
Lift It adopts stepping motor to control driving rotation, magnetic fluid seal, precise control, height range 0-100mm continuous adjustable;
MaskDrawer type structure, with a maximum load of less than 120 × 120mm samples, equipped with Japanese SMC pneumatic substrate baffle, fully automatic electrical linkage control.

Coating source 

Electron gun

Voltage 

Cathode voltage 8KV, cathode heating power AC 3V + 3V, 60A adjustable

Crucible

Cold crucible between beams 0-500ma, direct cold crucible 0-1a

The capacity of the crucible is 6-hole intercooling 4 × 17ml, 6-hole direct cooling 4 × 22ml, annular direct cooling 85ml

The positioning of crucible (four hole crucible) is controlled automatically or manually

Water inlet temperature of crucible cooling water ≤ 25 ℃, water inlet pressure ≥ 0.2MPa, water flow ≥ 8L / min

Number

1 set

Control system
Description With windows operation platform, cotrl2000 control system and IPC + network technology, the parameterization setting of main parts of the whole machine, real-time monitoring, fault intelligent diagnosis and automatic monitoring of film thickness are realized. There are two modes of automatic and manual control. In addition to taking lofting products, other operation processes are all controlled by software on PC; friendly man-machine operation interfaces such as vacuum system, process setting, gas filling and discharging system are provided; parameters can be set by formula on industrial computer to realize setting, storage and printing of program process and equipment parameters.
Specifications 

It can effectively solve the accuracy, stability and reliability of coating.

Perfect program interlock, complete anti misoperation design and protection; system water shortage, over flow pressure and other abnormal conditions alarm and implement corresponding protection measures.

Rich I / O interface design is adopted to fully meet the functional requirements of expansion and external connected equipment

The display controls the door opening / closing of the coater.

Coating process, process, film thickness, convenient and save printing.

Film thickness monitoring and control system

Description The quartz crystal diaphragm thickness controller is used, and the water-cooled diaphragm thickness probe is installed near the substrate platform and connected with the industrial computer. The film thickness meter is used to monitor the coating rate and final thickness in real time with an accuracy of ± 1a (0.1nm). The real-time information is fed back to the industrial computer. If the coating reaches the set thickness, it can automatically control the power supply, stop coating and realize the purpose of automatic film thickness control.
Range Monitoring thickness range: 1 Å ~ 99 μ 9999 Å, resolution: 1 Å

Features 

The coating process, process, and film thickness are all set on the PC, which can realize automatic control of the whole process. The coating process can be set on the PC and the data can be recorded.

Water cooling system 

Description 

The cooling water circuit is 8 in and 8 out, and the main water inlet is controlled by water pressure relay.

The total water inlet and outlet are connected to 1p refrigeration cycle water machine, with the temperature control range of 10 – 25 ℃. Provide stable cooling water for target, metal source, molecular pump and magnetic fluid to ensure stable operation of equipment.

Other instructions 
Product certification 

ISO9001 certification、CE certification、UL certification

Application considerationsPlease refer to the danger, warning, caution and other clauses in the manual for details