Mop300-R High Vacuum Resistance Thermal Evaporation Coating Machine

The manual system is suitable for undergraduate teaching, postgraduate scientific research training, and can also be applied to scientific research work. This device is suitable for magnetron sputtering, and can also be equipped with electron beam evaporation, thermal evaporation source, etc. Users can choose to equip it according to their needs.

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Mop300-R High Vacuum Resistance Thermal Evaporation Coating Machine

Technical Parameters:

  1 background vacuum: 10-7 Torr;

  2 single substrate design, size can be customized;

  3 The substrate can be rotated and heated: 300 ℃ / 500 ℃ / 800 ℃;

  4 Sputtering: 1-3 magnetron sputtering target guns, co-sputtering;

  5 Electron beam evaporation: 4-6 crucible

  6 thermal evaporation: 1-3 evaporation sources;




Vacuum chamber



Glass bell jar +304 stainless steel vacuum chamber base

304 stainless steel vacuum chamber, mirror polished inner surface

Vacuum system

Compound molecular pump + joint venture mechanical pump (molecular pump pumping speed ≥400L / s)

Control SystemManual buttonManual button

Extra vacuum

Better than 3×10-5Pa(2×10-7Torr)

Vacuum recovery time

Up to 3×10-4Pa≤15min

Evaporation source

2 ~ 3 groups of evaporation sources (compatible with metals and organics), can be co-evaporated

2 ~ 3 groups of evaporation sources (compatible with metals and organics), can be co-evaporated

Evaporation power

2KW, one belt and two vacuum evaporation power supply, constant current output

2KW, 1 belt with two constant current / constant power control, working current can be preset

Substrate stage

110mm square substrate or 15 ~ 25mm ITO / FTO glass 25 pieces, can be customized integrated high-precision etching mask plate;

Substrate table can choose heating (room temperature ~ 300 ℃ adjustable and controllable) or water cooling

Rate and film thickness monitoring

Monitoring thickness range: 1Å ~ 99µ9999Å, resolution 1Å; monitoring rate range: 0.1Å ~ 9999.9Å.S / s, resolution 0.1Å

Electronic control system

Manual button relay logic control; perfect program interlocking, complete anti-misoperation design and protection; system abnormalities such as water shortage, over-current and over-pressure alarm and corresponding protection measures are implemented


Cooling circulating water machine / film thickness monitor / substrate table heating or water cooling / evaporation power supply, etc.

Equipment distribution



Equipment size

Length × width: 1150mm×800mm; Length × width: 453"×315"