Vacuum glove box Vacuum evaporation glove box (referred to as vapor deposition for short) is a glove box technology that has developed early in PVD professional skills and is widely used in technology. Although sputter plating and ion plating developed later have advantages over vapor deposition in many aspects, vacuum transpiration professional skills still have many advantages, such as the relative simplicity of special equipment and processing technology, which can plate very pure The film layer, which can be prepared with a special structure and properties, is still a very important glove box professional skill nowadays. In recent years, because of the extensive application of electronic bombardment transpiration, high-frequency induction transpiration and laser transpiration in the professional skills of transpiration glove boxes, this professional skill has become more and more perfect.

  Place the film in the vacuum glove box and use the evaporation source to heat it to evaporate. When the average free path of the evaporated molecules is greater than the linear scale of the vacuum glove box, the vapor atoms and molecules escape from the surface of the evaporation source. Blocked by the impact of other molecules or atoms, it can directly reach the surface of the coated substrate. Because the substrate temperature is low, it will condense on it and form a film. In order to improve the adhesion of the evaporated molecules to the substrate, the substrate is subjected to Appropriate heating is required. In order to make the evaporation glove box run smoothly, it should have the vacuum conditions in the evaporation process and the evaporation conditions in the film production process.

  Vacuum conditions during evaporation: When the average free path of the vapor molecules in the vacuum glove box is greater than the distance between the evaporation source and the substrate (called the evaporation distance), sufficient vacuum conditions will be obtained. Therefore, it is necessary to increase the average free path of the remaining gas, thereby reducing the collision probability of the vapor molecules and the remaining gas molecules, and pumping the vacuum glove box into a high vacuum.

  The vacuum degree in the vacuum glove box process is not as high as possible, because when the vacuum in the vacuum glove box exceeds 10-6Pa, it is necessary to bake the vacuum system to achieve degassing. Because the degassing of baking will form the pollution of the substrate, the film can be produced under high vacuum of 10-5Pa without degassing by baking, and the quality of the film is not necessarily better than that of the film prepared under ultra high vacuum. Poor quality is worth noting. Therefore, in the vacuum transpiration glove box equipment, the vacuum degree selected in the glove box room should generally be higher than 10-2Pa and lower than 10-5Pa.

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