Mop400-O High Vacuum Organic Evaporation Coating Machine

The manual system is suitable for undergraduate teaching, postgraduate scientific research training, and can also be applied to scientific research work. This device is suitable for magnetron sputtering, and can also be equipped with electron beam evaporation, thermal evaporation source, etc. Users can choose to equip it according to their needs.



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Mop400-O High Vacuum Organic Evaporation Coating Machine

Technical Parameter

Vacuum coating room

Description

Material: Stainless steel 1.4301 (SUS type 304), thickness 5mm, all welding seams are connected by argon arc automatic welding technology; mirror polished inner surface, three treatments on outer surface.
Size: Φ400 × H450mm;

Volume0.072m³
Observation window

The door is equipped with a glass observation window (including anti-pollution baffle), which is convenient for observing the working situation at work.
Conform to the national standard of X-ray protection

Extra vacuum

≤6. 67x10-5pa (2×10-7Torr) (after baking and degassing)

Vacuum recovery time

≤6.67X10-4 pa(after baking and degassing)

Interface
Three standard interfaces (φ200), expand the installation of molecular pumps and plug-in valves;
Four standard interfaces (CF35) are reserved for extended functions;
IlluminationLED lighting is located on the side of the vacuum chamber for easy observation
Leak rate

The leak detection shall be carried out according to GB T 32218-2015, and the final acceptance test shall be conducted according to the standard of ≤1x10-10PaL / s.

Vacuum system
Description

Using "molecular pump + mechanical pump" high vacuum system:

Molecular pump
Pumping speed: 1200L / S, a true quasi-oil-free vacuum system, using down-pumping to avoid the pumping weakness of the molecular pump and improve the pumping speed; the molecular pump is guaranteed for 5 years and provides direct replacement service for damage.
  * Optional imported molecular pump
Vacuum pump

Specifications: Rotary vane vacuum pump, equipped with oil mist filter, with gas ballast control
Flow rate: 36 m³ / h (21 cfm), double substrate, vacuum * Optional dry vacuum pump

Operating VoltageAC 230 V / 50-60 Hz, 10 A power 3.5KW
Pumping speed

 Pumping from the atmosphere to 9×10-4Pa≤30min (exposure to the atmosphere for a short time, flushing with dry nitrogen and starting pumping)

Valve

Main valve: CC-200, high-vacuum electric linkage plug-in valve;
Front stage valve / bypass valve: GDQ-40 high vacuum pneumatic baffle valve;

Vacuum measurement

"Two lows and one high" (two resistance gauges measure low vacuum, one ionization gauge measures high vacuum) Digital display compound vacuum gauge, measuring range from  1×105Pa to 1×10-5Pa; displayed and controlled by PC, can be realized Operation interlocking linkage.
* Optional imported wide range vacuu
m transmitter

Vacuum measurement

Part adopts metal seal, part adopts fluorine rubber ring seal;

Substrate stage
Description
The sample table is made of 304 stainless steel, the substrate is placed directly above the evaporation source (full automatic lifting function), and the tooling is designed according to the size of the substrate to facilitate the user to fix the sample. Customizable high-precision etching mask plate;
SpinThe stepping motor is used to control the rotation, the magnetic fluid is sealed, the motor and the magnetic fluid are coaxial, and there will be no loss of rotation or crawling. The stepper motor is accurately controlled and the speed range is 0-30rpm continuously adjustable
LiftAdopt stepper motor to control rotation, magnetic fluid seal, precise control, height range 0-100mm continuously adjustable;
MaskDrawer-type structure, carrying the largest sample less than 120 × 120mm, equipped with Japanese SMC pneumatic substrate baffle, electric linkage automatic control.

Coating source

Organic evaporation source

Structure

Adopt organic sublimation beam source furnace, each steaming material can be equipped with 5CC, the upper part has a heat shield to prevent the heat of the evaporation boat from radiating upward, and there is a temperature interference device between the evaporation sources (easy to take and place, convenient for cleaning and maintenance).

Evaporation temperaturePID intelligent temperature control, can be heated to 600 ℃, temperature control accuracy ± 1 ℃;
Power supply
PID intelligent temperature control evaporation power supply, with evaporation source temperature measurement and power adjustment system, can perform real-time temperature measurement and temperature control, temperature control accuracy ± 1 ℃.

Number

2 sets

Organic evaporation power

Output Power

0~800W

ControlRS-485 interface, power supply is continuously adjustable from 0 to maximum power.

Number

2 sets

Control system
DescriptionManual key operation
Features

It can effectively solve the accuracy, stability and reliability of the coating.
Perfect program interlocking, complete anti-misoperation design and protection; system abnormalities such as water shortage, over-current and over-pressure alarm and corresponding protection measures are implemented.

Film thickness monitoring and control system

DescriptionA quartz crystal film thickness controller is used, a water-cooled film thickness probe is installed near the substrate table, and the industrial computer is connected. The film thickness meter is used to monitor the coating rate and final thickness in real time, and the accuracy can reach ± 1A (0.1nm). Real-time information is fed back to the industrial control machine. If the coating thickness reaches the set thickness, it can automatically control the power supply and stop the coating to achieve the purpose of automatic control of the film thickness.
Range
Monitoring thickness range: 1Å ~ 99µ9999Å, resolution 1Å; monitoring rate range: 0.1Å ~ 9999.9Å.S / s, resolution 0.1Å

Cooling system

Description

The cooling water path is 8 in and 8 out, and the total water intake is controlled by a water pressure relay.
The total inlet water and outlet water are connected with 1P refrigeration circulating water machine, and the temperature control range is 10-25 ℃. Provide stable cooling and circulating water to the target, metal source, molecular pump and magnetic fluid to ensure the stable operation of the equipment.

Other instructions
Product certification

ISO9001 certification、CE certification、UL certification

Application considerationsFor details, please refer to the instruction manual for danger, warning, caution, etc.