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Mop400-S Manual High Vacuum Magnetron Sputtering Coating Machine
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Mop400-S Manual High Vacuum Magnetron Sputtering Coating Machine
Vacuum coating room | ||
|---|---|---|
| Description | Material: Stainless steel 1.4301 (SUS type 304), thickness 5mm, all welding seams are connected by argon arc automatic welding technology; mirror polished inner surface, three treatments on outer surface. Size: Φ400 × H450mm; | |
| Volume | 0.056m³ | |
| Observation window | The door is equipped with a glass observation window (including anti-pollution baffle), which is convenient for observing the working situation at work. Conform to the national standard of X-ray protection | |
Extra vacuum | ≤6. 67x10-5pa （2×10-7Torr） (after baking and degassing) | |
Vacuum recovery time | ≤6.67X10-4 pa(after baking and degassing) | |
| Interface | Three standard interfaces (φ200), expand the installation of molecular pumps and plug-in valves; | |
| Four standard interfaces (CF35) are reserved for extended functions; | ||
| Illumination | LED lighting is located on the side of the vacuum chamber for easy observation | |
| Leak rate | The leak detection shall be carried out according to GB T 32218-2015, and the final acceptance test shall be conducted according to the standard of ≤1x10-10PaL / s. | |
| Vacuum system | ||
| Description | Using "molecular pump + mechanical pump" high vacuum system: | |
| Molecular pump | Pumping speed: 1200L / S, a true quasi-oil-free vacuum system, using down-pumping to avoid the pumping weakness of the molecular pump and improve the pumping speed; the molecular pump is guaranteed for 5 years and provides direct replacement service for damage. * Optional imported molecular pump | |
| Vacuum pump | Specifications: Rotary vane vacuum pump, equipped with oil mist filter, with gas ballast control Flow rate: 36 m³ / h (21 cfm), double substrate, vacuum -3 mbar or dry pump (optional) * Optional dry vacuum pump | |
| Operating voltage | AC 230 V / 50-60 Hz, 10 A or AC 115 V / 50-60 Hz, 20 A (optional) | |
| Pumping speed | Pumping from the atmosphere to 9 × 10-4Pa≤30min (exposure to the atmosphere for a short time, flushing with dry nitrogen and starting pumping) | |
| Valve | Main valve: CC-200, high-vacuum electric linkage plug-in valve; Front stage valve / bypass valve: GDQ-40 high vacuum pneumatic baffle valve; | |
| Vacuum measurement | "Two lows and one high" (two resistance gauges measure low vacuum, one ionization gauge measures high vacuum) Digital display compound vacuum gauge, measuring range from 1 × 105Pa to 1 × 10-5Pa; displayed and controlled by PC, can be realized Operation interlocking linkage. * Optional imported wide range vacuum transmitter | |
| Vacuum measurement | Part adopts metal seal, part adopts fluorine rubber ring seal; | |
| Substrate stage | ||
| Description | The sample table is made of 304 stainless steel, the substrate is placed directly above the evaporation source (full automatic lifting function), and the tooling is designed according to the size of the substrate to facilitate the user to fix the sample. Customizable high-precision etching mask plate; | |
| Spin | The stepping motor is used to control the rotation, the magnetic fluid is sealed, the motor and the magnetic fluid are coaxial, and there will be no loss of rotation or crawling. The stepper motor is accurately controlled and the speed range is 0-30rpm continuously adjustable | |
| Lift | Adopt stepper motor to control rotation, magnetic fluid seal, precise control, height range 0-100mm continuously adjustable; | |
| Mask | Drawer-type structure, carrying the largest sample less than 120 × 120mm, equipped with Japanese SMC pneumatic substrate baffle, electric linkage automatic control. | |
Coating source | ||
2 "permanent magnetron sputtering target (Target size diameter 50.8mm) | Structure | Centripetal sputtering, the distance between the magnetron target and the sample is adjustable from 90 to 140mm, each target has good water cooling and DC / RF / MF compatibility Electric control baffle assembly: 1 set Equipped with shielding cover to avoid cross contamination between targets (installation and use when non-co-sputtering); Can be folded to the center of the sample above, the distance between the target and the sample is adjustable; |
Number | 3 sets | |
Radio frequency (RF) sputtering power supply | Power | 0~600W |
| Control | RS-485 interface, power supply is continuously adjustable from 0 to maximum power. | |
Number | 1 set | |
DC sputtering power supply | Output Power | 0-1000W |
| Control | RS-485 interface, power supply is continuously adjustable from 0 to maximum power. | |
Number | 1 set | |
DC bias power supply | Description | 0~1000W |
| Control | RS-485 interface, power supply is continuously adjustable from 0 to maximum power. | |
Number | 1 set | |
| Ion current | Above 1A | |
| Rapid flow area | 30 degree half angle | |
Number | 1 set | |
Pneumatic system | Description | Process gas, argon (50SCCM), oxygen (20SCCM) gas mass flow control and display each one way. |
| Control | PID intelligent control, with corresponding cut-off valve and pipeline. | |
Number | 2 way | |
| crucible | Cold crucible between beams 0 ～ 500mA, direct cold crucible 0 ～ 1A The crucible capacity is 4 × 17mL with 6-well intercooling, 4 × 22mL with 6-well direct cooling, and 85mL with circular direct cooling Crucible positioning (four-hole crucible) is electronically controlled automatic or manual point control Crucible cooling water inlet temperature ≤ 25 ℃, inlet water pressure ≥ 0.2MPa, water flow ≥ 8L / min | |
number | 1 set | |
| Control system | ||
| Description | Adopt manual button control system. | |
| Features | It can effectively solve the accuracy, stability and reliability of the coating. Perfect program interlocking, complete anti-misoperation design and protection; system abnormalities such as water shortage, over-current and over-pressure alarm and corresponding protection measures are implemented. It adopts rich I / O interface design to fully meet the functional requirements of expansion and external devices. The display controls the door opening / closing of the coating machine. | |
Film thickness monitoring and control system | ||
| Description | A quartz crystal film thickness controller is used, a water-cooled film thickness probe is installed near the substrate table, and the industrial computer is connected. The film thickness meter is used to monitor the coating rate and final thickness in real time, and the accuracy can reach ± 1A (0.1nm). Real-time information is fed back to the industrial control machine. If the coating thickness reaches the set thickness, it can automatically control the power supply and stop the coating to achieve the purpose of automatic control of the film thickness. | |
| Range | Monitoring thickness range: 1Å ～ 99µ9999Å, resolution 1Å; monitoring rate range: 0.1Å ～ 9999.9Å.S / s, resolution 0.1Å | |
Specifications | The coating process, process, and film thickness are all set on the PC, which can realize automatic control of the whole process. The coating process can be set on the PC and the data can be recorded. | |
Cooling system | ||
Description | The cooling water path is 8 in and 8 out, and the total water intake is controlled by a water pressure relay. The total inlet water and outlet water are connected with 1P refrigeration circulating water machine, and the temperature control range is 10-25 ℃. Provide stable cooling and circulating water to the target, metal source, molecular pump and magnetic fluid to ensure the stable operation of the equipment. | |
Optional equipment | ||
| Substrate stage | Heating | The use of special vacuum armored heating wire avoids the problems of traditional heating elements contaminating the vacuum chamber, contaminating the substrate, short life, and requiring frequent maintenance. The heating temperature is: room temperature ~ 300 ℃, the temperature control adopts imported Japan Shiden Electric PID intelligent temperature controller, the temperature control accuracy is ± 1 ℃. |
| Water cooling | A stepper motor is used to control the drive rotation, dynamic sealing, and one water flow in and one out. | |
| Liquid nitrogen cooling | Patented product: A stepper motor is used to control the rotation, the magnetic fluid is sealed, the motor and the magnetic fluid are coaxial, the measured temperature is -160 ℃ | |
| Select film coating | Patented product: arbitrary film selection, automatic transfer and alignment in the home position, adjustable deposition height. | |
| Automatic coordination coating | Patented product: film-selection stepless selection and coating function, automatic transfer and alignment for homing, adjustable deposition height | |
| Stepless flip and rotation | Patented product: realize horizontal and vertical rotation of the substrate, stepless rotation and heating, can achieve high uniformity coating. | |
| 3 "permanent magnetron sputtering target (target size D76.2mm) | Centripetal sputtering, the distance between the magnetron target and the sample is adjustable from 90 to 110mm, has good water cooling and is DC / RF / MF compatible | |
| 2 "strong magnetron sputtering target (target size D56.8mm) | Strong magnetic design, centripetal sputtering, the distance between the magnetron target and the sample is adjustable from 90 to 110mm, has good water cooling and DC / RF / MF compatibility | |
| 3 "strong magnetron sputtering target (target size D76.2mm) | Strong magnetic design, centripetal sputtering, the distance between the magnetron target and the sample is adjustable from 90 to 110mm, has good water cooling and DC / RF / MF compatibility | |
| RF switch | Design 1 shift 2 shift gear function (that is, 1 set of power supply can be used for 2 sets of magnetron sputtering target at the same time), before and after shifting, there is generally no need to adjust other parameters of the power supply except power setting. | |
Vacuum baking / degassing | Double heater design; Power: 1200 W; Mounting flange: CF35; Quickly degas the vacuum chamber to improve the vacuum; The baking time is shorter than the baking oven and heating belt; | |
| Sample compartment | Door opening structure, size is about ø200 X 300mm Vacuum system: mechanical pump, molecular pump, valve Ultimate vacuum: ≤6.67X10-4 pa (after degassing after baking). Vacuum recovery time: 30 minutes can reach 6.6x10-3 Pa (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start) | |
| Chamber heating | The vacuum chamber is equipped with a heating system, the temperature is 200 ℃, and the temperature control is ± 1 ℃ | |
| Cooling system | The cooling water path is 8 in and 8 out, and the total water intake is controlled by a water pressure relay. The total inlet water and outlet water are connected with 1P refrigeration circulating water machine, and the temperature control range is 10-25 ℃. Provide stable cooling and circulating water to the metal source, molecular pump and magnetic fluid to ensure the stable operation of the equipment. | |
| Other instructions | ||
| Product certification | ISO9001 certification、CE certification、UL certification | |
| Application considerations | For details, please refer to the instruction manual for danger, warning, caution, etc. | |
