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Main ApplicationsCreate oxygen-free and moisture-free environment for organometallic chemistry, orga..
PictureInstallation methods NW40 PortFeatures- Easy user calibration procedure- Low maintenanc..
磁控溅射是物理气相沉积技术(Physical Vapor Deposition, PVD)的一种。一般用于制备金属、半导体、绝缘体等薄膜材料,具有设备简单、易于控制、效率高,面积大等优点。
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α-1200U Inert Vacuum Controlled Atmospheres GloveboxExternal StructureChamber CapacityApproximately ..
α-800P Mini Glovebox External StructureChamber CapacityApproximately 13.1 cu.F.t (0.37 m³)Overa..
α-1200U Separated Inert Vacuum Controlled Atmospheres GloveboxExternal StructureChamber CapacityAppr..
α-800P Mini Glovebox With Auto Purging And Gas PurificationExternal StructureChamber CapacityApproxi..